Textual Modalities for: Etching
Records: Showing 20 of 573 total records
Page: 3 of 29
| Code | Title | Description | Source | Word Counts | URL |
|---|---|---|---|---|---|
| 347901.1 | hard mask etching: Topics by Science.gov | Self-etch and etch-and-rinse adhesive systems in clinical dentistry.PubMed. Ozer, Fusun; Blatz, Mark... | Total words: 99,817 | etching: 1235 | View | |
| 347901.1 | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A ... | Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal as... | Total words: 2,450 | etching: 25 | View | |
| 347901.1 | Multi-Layer Application of Self-Etch and Universal Adhesives and the ... | They can be classified in three categories regarding bonding techniques to the dental substrates: th... | Total words: 6,330 | etching: 6 | View | |
| 347901.1 | Process for Smoothing an Si Substrate after Etching of SiO2 | A reactive-ion etching (RIE) process for smoothing a silicon substrate has been devised. The process... | Total words: 461 | etching: 11 | View | |
| 347901.1 | Process Specification for Pickling, Etching, and Descaling of Metals - NASA | Aluminum Etch: 10 g NaOH, 90 ml water Ambient swab or immerse for 5-15 minutes Desmut: 50% nitric ac... | Total words: 3,028 | etching: 26 | View | |
| 347901.1 | Single-pulse writing of a concave microlens array - PubMed | By subsequent wet etching, a close-packed hexagonal arrangement, 3D concave microlens array on a cur... | Total words: 887 | etching: 3 | View | |
| 347901.1 | Plasma Etching Uniformity Control for Making Large and Thick ... - NIST | same recipe for the same etching time. The etching depth non-uniformity on 0.5 mm thick quartz acros... | Total words: 2,112 | etching: 54 | View | |
| 347901.1 | molten koh etching: Topics by Science.gov | Optimization of KOH etching parameters for quantitative defect recognition in n- and p-type doped Si... | Total words: 90,297 | etching: 1224 | View | |
| 347901.1 | HAR Dielectric Cryo Etch: Mechanisms, Hypotheses, GapsPDF | Hypothesis for Reduced Aspect Ratio Dependent Etching ARDE – Aspect Ratio Dependent Etching: Small... | Total words: 1,111 | etching: 22 | View | |
| 347901.1 | A Study on the O2 Plasma Etching Method of Spray-Formed SWCNT Films and ... | Abstract. In this study, we analyzed the morphological changes and molecular structure changes on th... | Total words: 4,919 | etching: 73 | View | |
| 347901.1 | Monte Carlo simulation of nanoscale material focused ion beam gas ... | Similar to the Ga + recipes, gas etching is the dominant mechanism by which material is removed from... | Total words: 9,220 | etching: 80 | View | |
| 347901.1 | 3D Patterning of Si by Contact Etching With Nanoporous Metals | Nanoporous gold and platinum electrodes are used to pattern n-type silicon by contact etching at the... | Total words: 9,165 | etching: 103 | View | |
| 347901.1 | Investigation of Copper Etching with a Ferric Nitrate Solution | Etching techniques are essential for the fabrication of fine structures, devices, and circuits. This... | Total words: 837 | etching: 5 | View | |
| 347901.1 | Plasma etching uniformity control for making large and thick ... - NIST | etching uniformity. RF power along with chamber pressure deter-mines the breakdown of etching gas an... | Total words: 2,037 | etching: 51 | View | |
| 347901.1 | Adhesion performance of a universal adhesive in the root canal: Effect ... | Self-etching (SE) systems have been introduced to overcome and simplify the sensitive bonding proced... | Total words: 6,823 | etching: 14 | View | |
| 347901.1 | Wet Etching of Quartz Using a Solution Based on Organic Solvents and ... | The quartz-crystal resonator is the core device for frequency control in modern communication system... | Total words: 4,579 | etching: 130 | View | |
| 347901.1 | What are Vin etching What are Vin etching What are Vin etching and M of ... | What is VIN Etching? VIN etching is the engraving of the complete Vehicle Identi-fication Number (VI... | Total words: 1,071 | etching: 24 | View | |
| 347901.1 | Ion beam etching redeposition for 3D multimaterial nanostructure ... | The local sputtering of photoresist sidewalls during ion beam etching enables nanoscale structures t... | Total words: 4,893 | etching: 37 | View | |
| 347901.1 | Diagnostics of low-pressure oxygen RF plasma and the mechanism for ... | The U.S. Department of Energy's Office of Scientific and Technical Information | Total words: 935 | etching: 27 | View | |
| 347901.1 | fluorocarbon plasma etching: Topics by Science.gov | Plasma & reactive ion etching to prepare ohmic contacts. DOEpatents. Gessert, Timothy A. 2002-01-01.... | Total words: 97,854 | etching: 1579 | View |
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